SW-AT35(Al2O3)
| Purity (%) | Particle Size (㎛) | Flow-ability (g/s) | Apparent density (g/㎤) | Applications |
|---|---|---|---|---|
| 99.99 | -53 ~ 10 | 4.0 | 1.8 | high-temperature environment, plasma resistance environment, insulation ESC, chamber shield and so on |
SW-YOF
| Purity (%) | Particle Size (㎛) | Flow-ability (g/s) | Apparent density (g/㎤) | Applications |
|---|---|---|---|---|
| 99.99 | -63 ~ 10 | 3.5 | 1.67 | Next generation Semiconductor |
SW-Mullite
| Purity (%) | Particle Size (㎛) | Flow-ability (g/s) | Apparent density (g/㎤) | Applications |
|---|---|---|---|---|
| 99.90 | -63 ~ 10 | 2.5 | 1.06 | high-temperature buffering layer |